Silicon microlenses for IR image sensors

N. M. Ravindra, F. M. Tong, D. Pattnaik, D. Ivanov, R. A. Levy, K. Aryusook, V. Patel

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations


We report a comprehensive approach to design, fabricate and characterize silicon microlenses for applications in IR image sensors. ZEMAX design tool was used to assist in the design of the lenses. Conventional photolithography and thermal reflow of melting resist technique were deployed to achieve spherical resists patterns. Reactive ion etching (RIE) was utilized for transfer of resist patterns to the substrate in O2 and C2F6 environment. The shape of the fabricated lenses, i.e. radii of curvature and focal length were controlled within a wide range, by controlling the etch rates of resist and substrate, which were further controlled by varying the flow of gases, selectivity and power. Optical methods such as ray analysis and profilometry were used to obtain lens properties. Scanning electron microscopy was performed to analyze the morphology of the fabricated lenses.

Original languageEnglish (US)
Pages (from-to)152-161
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1998
EventMicromachining and Microfabrication Process Technology IV - Santa Clara, CA, United States
Duration: Sep 21 1998Sep 22 1998

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


  • IR image sensors
  • Microlenses
  • Photolithography
  • Thermal reflow


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