M. Boehm, A. E. Delahoy, F. B. Ellis, E. Eser, S. C. Gau, F. J. Kampas, Z. Kiss, K. R. Ramaprasad, H. Volltrauer, H. Weakliem

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations


A process for the production of monolithically interconnected amorphous silicon photovoltaic panels is outlined. The process is presently used in Chronar's commercial manufacturing facilities. It uses an array of large-area single-chamber glow discharge systems for the deposition of the amorphous silicon layers. Float glass is used as the substrate and individual panels 3 ft multiplied by 1 ft be coated. The substrates are mounted vertically in box carriers for insertion into the chambers. SIMS and spectral response data confirm that cross-contamination in a properly designed single chamber system is comparable to that of multichamber systems. Data for the process yield and the I-V curves of a small area test cell (10. 2% efficiency) and a 1 ft**2 panel (7. 2% efficiency) are reported.

Original languageEnglish (US)
Pages (from-to)888-893
Number of pages6
JournalConference Record of the IEEE Photovoltaic Specialists Conference
StatePublished - 1985
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering


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