Abstract
A process for the production of monolithically interconnected amorphous silicon photovoltaic panels is outlined. The process is presently used in Chronar's commercial manufacturing facilities. It uses an array of large-area single-chamber glow discharge systems for the deposition of the amorphous silicon layers. Float glass is used as the substrate and individual panels 3 ft multiplied by 1 ft be coated. The substrates are mounted vertically in box carriers for insertion into the chambers. SIMS and spectral response data confirm that cross-contamination in a properly designed single chamber system is comparable to that of multichamber systems. Data for the process yield and the I-V curves of a small area test cell (10. 2% efficiency) and a 1 ft**2 panel (7. 2% efficiency) are reported.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 888-893 |
| Number of pages | 6 |
| Journal | Conference Record of the IEEE Photovoltaic Specialists Conference |
| State | Published - 1985 |
| Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Control and Systems Engineering
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering