The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.
|Original language||English (US)|
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Mar 2001|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering