Abstract
The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.
Original language | English (US) |
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Pages (from-to) | 476-481 |
Number of pages | 6 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 19 |
Issue number | 2 |
DOIs | |
State | Published - Mar 2001 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering