Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

J. A. Liddle, M. I. Blakey, K. Bolan, R. C. Farrow, G. M. Gallatin, R. Kasica, V. Katsap, C. S. Knurek, J. Li, M. Mkrtchyan, A. E. Novembre, L. Ocola, P. A. Orphanos, M. L. Peabody, S. T. Stanton, K. Teffeau, W. K. Waskiewicz, E. Munro

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.

Original languageEnglish (US)
Pages (from-to)476-481
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number2
DOIs
StatePublished - Mar 2001

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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