Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

J. A. Liddle; M. I. Blakey; K. Bolan; R. C. Farrow; G. M. Gallatin; R. Kasica; V. Katsap; C. S. Knurek; J. Li; M. Mkrtchyan; A. E. Novembre; L. Ocola; P. A. Orphanos; M. L. Peabody; S. T. Stanton; K. Teffeau; W. K. Waskiewicz; E. Munro

doi:10.1116/1.1359174

Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

J. A. Liddle
, M. I. Blakey
, K. Bolan
, R. C. Farrow
, G. M. Gallatin
, R. Kasica
, V. Katsap
, C. S. Knurek
, J. Li
, M. Mkrtchyan
, A. E. Novembre
, L. Ocola
, P. A. Orphanos
, M. L. Peabody
, S. T. Stanton
, K. Teffeau
, W. K. Waskiewicz
, E. Munro

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.

Original language	English (US)
Pages (from-to)	476-481
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	2
DOIs	https://doi.org/10.1116/1.1359174
State	Published - Mar 2001
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1359174

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Liddle, J. A., Blakey, M. I., Bolan, K., Farrow, R. C., Gallatin, G. M., Kasica, R., Katsap, V., Knurek, C. S., Li, J., Mkrtchyan, M., Novembre, A. E., Ocola, L., Orphanos, P. A., Peabody, M. L., Stanton, S. T., Teffeau, K., Waskiewicz, W. K., & Munro, E. (2001). Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 19(2), 476-481. https://doi.org/10.1116/1.1359174

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title = "Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system",

abstract = "The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.",

author = "Liddle, \{J. A.\} and Blakey, \{M. I.\} and K. Bolan and Farrow, \{R. C.\} and Gallatin, \{G. M.\} and R. Kasica and V. Katsap and Knurek, \{C. S.\} and J. Li and M. Mkrtchyan and Novembre, \{A. E.\} and L. Ocola and Orphanos, \{P. A.\} and Peabody, \{M. L.\} and Stanton, \{S. T.\} and K. Teffeau and Waskiewicz, \{W. K.\} and E. Munro",

year = "2001",

month = mar,

doi = "10.1116/1.1359174",

language = "English (US)",

volume = "19",

pages = "476--481",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

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number = "2",

}

Liddle, JA, Blakey, MI, Bolan, K, Farrow, RC, Gallatin, GM, Kasica, R, Katsap, V, Knurek, CS, Li, J, Mkrtchyan, M, Novembre, AE, Ocola, L, Orphanos, PA, Peabody, ML, Stanton, ST, Teffeau, K, Waskiewicz, WK & Munro, E 2001, 'Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 2, pp. 476-481. https://doi.org/10.1116/1.1359174

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T2 - Results from the SCALPEL proof-of-lithography system

AU - Liddle, J. A.

AU - Blakey, M. I.

AU - Bolan, K.

AU - Farrow, R. C.

AU - Gallatin, G. M.

AU - Kasica, R.

AU - Katsap, V.

AU - Knurek, C. S.

AU - Li, J.

AU - Mkrtchyan, M.

AU - Novembre, A. E.

AU - Ocola, L.

AU - Orphanos, P. A.

AU - Peabody, M. L.

AU - Stanton, S. T.

AU - Teffeau, K.

AU - Waskiewicz, W. K.

AU - Munro, E.

PY - 2001/3

Y1 - 2001/3

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AB - The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.

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SN - 1071-1023

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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IS - 2

ER -

Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

Abstract

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