Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

J. A. Liddle; M. I. Blakey; K. Bolan; R. C. Farrow; G. M. Gallatin; R. Kasica; V. Katsap; C. S. Knurek; J. Li; M. Mkrtchyan; A. E. Novembre; L. Ocola; P. A. Orphanos; M. L. Peabody; S. T. Stanton; K. Teffeau; W. K. Waskiewicz; E. Munro

doi:10.1116/1.1359174

Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

J. A. Liddle, M. I. Blakey, K. Bolan, R. C. Farrow, G. M. Gallatin, R. Kasica, V. Katsap, C. S. Knurek, J. Li, M. Mkrtchyan, A. E. Novembre, L. Ocola, P. A. Orphanos, M. L. Peabody, S. T. Stanton, K. Teffeau, W. K. Waskiewicz, E. Munro

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.

Original language	English (US)
Pages (from-to)	476-481
Number of pages	6
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	2
DOIs	https://doi.org/10.1116/1.1359174
State	Published - Mar 2001
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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Liddle, J. A., Blakey, M. I., Bolan, K., Farrow, R. C., Gallatin, G. M., Kasica, R., Katsap, V., Knurek, C. S., Li, J., Mkrtchyan, M., Novembre, A. E., Ocola, L., Orphanos, P. A., Peabody, M. L., Stanton, S. T., Teffeau, K., Waskiewicz, W. K., & Munro, E. (2001). Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 19(2), 476-481. https://doi.org/10.1116/1.1359174

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title = "Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system",

abstract = "The space-charge induced blur in the scattering with angular limitation projection electron-beam lithography (SCALPEL) proof-of-lithography systems was measured under conditions similar to those that would be employed in a high-throughput machine. Measurement results are consistent with the predictions made by current simulation tools.",

author = "Liddle, \{J. A.\} and Blakey, \{M. I.\} and K. Bolan and Farrow, \{R. C.\} and Gallatin, \{G. M.\} and R. Kasica and V. Katsap and Knurek, \{C. S.\} and J. Li and M. Mkrtchyan and Novembre, \{A. E.\} and L. Ocola and Orphanos, \{P. A.\} and Peabody, \{M. L.\} and Stanton, \{S. T.\} and K. Teffeau and Waskiewicz, \{W. K.\} and E. Munro",

year = "2001",

month = mar,

doi = "10.1116/1.1359174",

language = "English (US)",

volume = "19",

pages = "476--481",

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Liddle, JA, Blakey, MI, Bolan, K, Farrow, RC, Gallatin, GM, Kasica, R, Katsap, V, Knurek, CS, Li, J, Mkrtchyan, M, Novembre, AE, Ocola, L, Orphanos, PA, Peabody, ML, Stanton, ST, Teffeau, K, Waskiewicz, WK & Munro, E 2001, 'Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 19, no. 2, pp. 476-481. https://doi.org/10.1116/1.1359174

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T1 - Space-charge effects in projection electron-beam lithography

T2 - Results from the SCALPEL proof-of-lithography system

AU - Liddle, J. A.

AU - Blakey, M. I.

AU - Bolan, K.

AU - Farrow, R. C.

AU - Gallatin, G. M.

AU - Kasica, R.

AU - Katsap, V.

AU - Knurek, C. S.

AU - Li, J.

AU - Mkrtchyan, M.

AU - Novembre, A. E.

AU - Ocola, L.

AU - Orphanos, P. A.

AU - Peabody, M. L.

AU - Stanton, S. T.

AU - Teffeau, K.

AU - Waskiewicz, W. K.

AU - Munro, E.

PY - 2001/3

Y1 - 2001/3

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IS - 2

ER -

Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

Abstract

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