Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system

J. A. Liddle, M. I. Blakey, K. Bolan, R. C. Farrow, G. M. Gallatin, R. Kasica, V. Katsap, C. S. Knurek, J. Li, M. Mkrtchyan, A. E. Novembre, L. Ocola, P. A. Orphanos, M. L. Peabody, S. T. Stanton, K. Teffeau, W. K. Waskiewicz, E. Munro

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