Split-drain magnetic field-effect transistor channel charge trapping and stress induced sensitivity deterioration

Zhenyi Yang, Sik Lam Siu, Wing Shan Tam, Chi Wah Kok, Chi Wah Leung, P. T. Lai, Hei Wong, Wing Man Tang, P. W.T. Pong

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

This paper proposed an analytical model on the deterioration of magnetic sensitivity of sectorial split-drain magnetic field-effect transistors (SD-MAGFETs). The deterioration is governed by the trap fill rate at the channel boundary traps, which is geometric dependent. Experimental results are presented which show good consistency with the analytical derivation. The deterioration is the most severe at a sector angle of 54.6°, which shows a design tradeoff with sensing hysteresis. Design guidelines for sectorial SD-MAGFET to obtain high sensitivity hysteresis and slow sensitivity deterioration are also presented which provide important information for efficient design.

Original languageEnglish (US)
Article number2279849
JournalIEEE Transactions on Magnetics
Volume50
Issue number1
DOIs
StatePublished - Jan 2014
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Keywords

  • Magnetic field-effect transistor (MAGFET)
  • Sectorial
  • Sensitivity
  • Sensitivity deterioration
  • Split-drain

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