Sputter-deposited BCC tantalum on steel with the interfacial tantalum nitride layer

Anamika Patel, Leszek Gladczuk, Charanjeet Singh Paur, Marek Sosnowski

Research output: Contribution to journalConference articlepeer-review

6 Scopus citations


Tantalum has mainly two phases: alpha phase (bcc structure) and beta phase (tetragonal structure). The meta-stable beta phase is usually obtained in sputtered films. Alpha phase is preferred over the beta for some applications as beta phase is very brittle. One of such application is to protect steel from the erosive and the corrosive wear. It was found that with the intermediate layer of tantalum nitride the preferred alpha phase was grown on steel by DC magnetron sputtering technique. Electrical and structural properties of these films were studied by four-point probe measurement and x-ray diffraction (XRD). Stoichiometry of the interracial tantalum nitride layer was investigated by nuclear reaction analysis (NRA). Influence of the interfacial film thickness and the ratio of argon and nitrogen gas during reactive deposition of tantalum nitride on the tantalum phase were investigated. This work also reports on the dependence of tantalum phase on the substrate temperature (100-400°C) during sputtering in Ar and Kr gases.

Original languageEnglish (US)
Pages (from-to)147-152
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
StatePublished - 2002
EventSurface Engineering 2001 - Fundamentals and Applications - Boston, MA, United States
Duration: Nov 26 2002Nov 29 2002

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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