Sputtering of Si with decaborane cluster ions

Marek Sosnowski, Maria A. Albano, Cheng Li, Hans Joachim L. Gossmann, Dale C. Jacobson

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Decaborane cluster ions (B10Hx+) may play an important role in the manufacturing of future semiconductor devices, as they facilitate a very shallow implantation of B with a relatively high beam energy, due to its partition among the constituent atoms. While the formation of B-doped shallow junctions in Si has been demonstrated, little is known about other effects of these complex ions on a solid. We have measured the sputtering yield of Si with decaborane cluster ions at 12 keV and demonstrated that their impacts smooth rather than roughen the surface, similarly to much larger Ar cluster ions. The results have implications for the understanding of low-energy atomic impacts in terms of collective motion of many surface atoms and of the behavior of solids far from equilibrium.

Original languageEnglish (US)
Pages (from-to)592-594
Number of pages3
JournalApplied Physics Letters
Volume80
Issue number4
DOIs
StatePublished - Jan 28 2002

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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