Structural and some other properties of silicon deposited in an SiCl₄H₂ r.f. discharge

Keyphrases

• Annealing 100%
• Raman Scattering 50%
• X-ray Scattering 50%
• High Vacuum 50%
• X-ray Photoelectron Spectroscopy 50%
• Thermal Desorption 50%
• Rutherford Backscattering 50%
• Polysilicon 50%
• Crystallite Size 50%
• Optical Absorption 50%
• Scattered Data 50%
• Raman Lines 50%
• Hydrogen Concentration 50%
• Chlorine Content 50%
• Peak Frequency 50%
• Hydrogen Evolution 50%
• IR Absorption 50%
• Absorption-desorption 50%

Engineering

• Data Show 100%
• Thin Films 100%
• Polycrystalline 100%
• Ray Photoelectron Spectroscopy 100%
• Polysilicon 100%
• Crystallite Size 100%
• Peak Frequency 100%
• Rf Discharge 100%

Physics

• Polycrystalline 100%
• Thin Films 50%
• Raman Spectra 50%
• Electromagnetic Absorption 50%
• Desorption 50%
• X Ray Spectroscopy 50%
• Backscattering 50%
• X Ray Scattering 50%
• Crystallite 50%