Structure and stability of metastable α-Sn

M. T. Asom, A. R. Kortan, L. C. Kimerling, R. C. Farrow

Research output: Contribution to journalArticlepeer-review

31 Scopus citations

Abstract

We report for the first time the growth of high quality films of metastable α-Sn. The structural properties of the molecular beam epitaxy grown metastable α-Sn are investigated by means of in situ reflection high-energy electron diffraction (RHEED) analysis, scanning electron microscopy including electron channeling patterns, and high-resolution x-ray scattering techniques. Scanning electron microscopy reveals a growth morphology of smooth and uniform surfaces. RHEED patterns yield a highly streaked (2×1) surface reconstruction suggesting a layer-by-layer growth mechanism. Triple-axis x-ray diffractometry was employed to determine structural parameters and the strain distribution. In-plane rocking scans of the (400) reflection indicate a half width of 3 arcsec for the heterostructure α-Sn/InSb. Out-of-plane scans reveal a tetragonal distortion perpendicular to the film plane, contributing a net strain of ∼0.28%. These results are in quantitative agreement with values calculated using simple elastic theory.

Original languageEnglish (US)
Pages (from-to)1439-1441
Number of pages3
JournalApplied Physics Letters
Volume55
Issue number14
DOIs
StatePublished - 1989
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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