Suppressed boron diffusion in bulk silicon below strained (100) Si 1-xGe x surfaces during nitrogen annealing

M. S. Carroll, Y. S. Suh, R. Levy

Research output: Contribution to conferencePaperpeer-review

Fingerprint

Dive into the research topics of 'Suppressed boron diffusion in bulk silicon below strained (100) Si <sub>1-x</sub>Ge <sub>x</sub> surfaces during nitrogen annealing'. Together they form a unique fingerprint.

Engineering & Materials Science