Surface Morphology Evolution of Chemical Vapor-Deposited Tungsten Films on Si(100)

Luis Vázquez, Roberto C. Salvarezza, Ezequiel Albano, Alejandro J. Arvia, Alberto Hernández Creus, Roland A. Levy, José M. Albella

Research output: Contribution to journalArticlepeer-review

5 Scopus citations
Original languageEnglish (US)
Pages (from-to)89-91
Number of pages3
JournalChemical Vapor Deposition
Issue number3
StatePublished - May 1998

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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