Surface Morphology Evolution of Chemical Vapor-Deposited Tungsten Films on Si(100)

  • Luis Vázquez
  • , Roberto C. Salvarezza
  • , Ezequiel Albano
  • , Alejandro J. Arvia
  • , Alberto Hernández Creus
  • , Roland A. Levy
  • , José M. Albella

Research output: Contribution to journalArticlepeer-review

6 Scopus citations
Original languageEnglish (US)
Pages (from-to)89-91
Number of pages3
JournalChemical Vapor Deposition
Volume4
Issue number3
DOIs
StatePublished - May 1998

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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