Synchrotron high angular resolution microdiffraction analysis of selective area grown optoelectronic waveguide arrays

A. Kazimirov, A. A. Sirenko, D. H. Bilderback, Z. H. Cai, B. Lai, R. Huang, A. Ougazzaden

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

A synchrotron microbeam high-angular resolution diffraction setup based on a phase zone plate and a perfect Si(004) analyzer crystal was introduced to generate an x-ray microbeam with a lateral size of 0.24 νm and an angular resolution of 2 arcsec. The microbeam high angular resolution x-ray diffraction was applied to study InGaAlAs-based multiple quantum well (MQW) ridge-waveguide arrays produced by metal-organic vapour-phase epitaxy in a selective area growth regime with a central waveguide width varying from 1.6 to 60 νm. The analysis of the period T and the strain S in MQW ridge structures determined from the high-resolution diffraction data is presented. It was found that the MQW period is uniform across the ridge within the error bar of ΔT = 0.25 nm. Within the waveguide array, the MQW period and strain can be adequately described by a gas-phase diffusion model.

Original languageEnglish (US)
Pages (from-to)1422-1426
Number of pages5
JournalJournal of Physics D: Applied Physics
Volume39
Issue number7
DOIs
StatePublished - Apr 7 2006

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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