TY - GEN
T1 - Synthesis and characterization of ternary cobalt spinal oxides for photoelectrochemical water splitting to produce hydrogen
AU - Shet, Sudhakar
AU - Yan, Yanfa
AU - Deutsch, Todd
AU - Wang, Heli
AU - Ravindra, Nuggehalli
AU - Turner, John
AU - Al-Jassim, Mowafak
PY - 2010
Y1 - 2010
N2 - We present an experimental investigation of ternary cobalt spinal oxides for photoelectrochemical water splitting to produce hydrogen. In this study, Co1+δX2-δO4(X = Al, Ga, In) thin films were deposited using RF magnetron reactive co-sputtering system. All the thin films were deposited on silver/stainless steel and on quartz substrate, because of the high temperature (800°C) oxide growth. We found that these thin films show excellent stability in solution and good visible light absorption. However, their performance as photoelectrochemical catalyst is limited by the poor transport properties induced by small polaron mobility.
AB - We present an experimental investigation of ternary cobalt spinal oxides for photoelectrochemical water splitting to produce hydrogen. In this study, Co1+δX2-δO4(X = Al, Ga, In) thin films were deposited using RF magnetron reactive co-sputtering system. All the thin films were deposited on silver/stainless steel and on quartz substrate, because of the high temperature (800°C) oxide growth. We found that these thin films show excellent stability in solution and good visible light absorption. However, their performance as photoelectrochemical catalyst is limited by the poor transport properties induced by small polaron mobility.
KW - Band gap
KW - Cobalt spinal oxides
KW - Crystallinity
KW - Doping
KW - Gas ambient
KW - Photoelectrochemical
KW - RF power
KW - Sputter
KW - Substrate temperature
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M3 - Conference contribution
AN - SCOPUS:79952692477
SN - 9781617820328
T3 - Materials Science and Technology Conference and Exhibition 2010, MS and T'10
SP - 268
EP - 275
BT - Materials Science and Technology Conference and Exhibition 2010, MS and T'10
T2 - Materials Science and Technology Conference and Exhibition 2010, MS and T'10
Y2 - 17 October 2010 through 21 October 2010
ER -