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Tantalum thin films deposited by ion assisted magnetron sputtering
Hua Ren, Marek Sosnowski
Electrical and Computer Engineering
Research output
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Contribution to journal
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Article
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peer-review
43
Scopus citations
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Keyphrases
Magnetron Sputtering
100%
Tantalum Oxide Thin Films
100%
Ion-assisted
100%
Simple System
50%
Scanning Electron Microscopy
50%
Atomic Force Microscopy
50%
X Ray Diffraction
50%
Rutherford Backscattering
50%
Ta Films
50%
Radio Frequency Magnetron Sputtering
50%
Ambient Temperature
50%
Ion Effect
50%
Ion Bombardment
50%
Body-centered Cubic
50%
Industrial Operation
50%
Flux Conditions
50%
Ion Flux
50%
Substrate Bias
50%
Cubic Phase
50%
Polycrystalline Aluminum
50%
Negative Bias Voltage
50%
Engineering
Thin Films
100%
Magnetron
100%
Energy Engineering
50%
Radio Frequency
50%
Polycrystalline
50%
Ion Implantation
50%
Ray Diffraction
50%
Atomic Force Microscopy
50%
Body-Centered Cubic
50%
Bias Voltage
50%
Growing Film
50%
Substrate Bias
50%
Simple System
50%
Bombarding Ion
50%
Material Science
Film
100%
Thin Films
100%
Magnetron Sputtering
100%
Tantalum
100%
Silicon
50%
Scanning Electron Microscopy
50%
Aluminum
50%
Ion Implantation
50%
X-Ray Diffraction
50%
Film Growth
50%
Physics
Thin Films
100%
Magnetron Sputtering
100%
Ion Current
50%
Polycrystalline
50%
Atomic Force Microscopy
50%
X Ray Diffraction
50%
Backscattering
50%
Scanning Electron Microscopy
50%