Skip to main navigation
Skip to search
Skip to main content
New Jersey Institute of Technology Home
Help & FAQ
Home
Profiles
Research units
Equipment
Projects
Research output
Search by expertise, name or affiliation
Tantalum thin films deposited by ion assisted magnetron sputtering
Hua Ren,
Marek Sosnowski
Electrical and Computer Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
36
Scopus citations
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Tantalum thin films deposited by ion assisted magnetron sputtering'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Engineering & Materials Science
Tantalum
100%
Magnetron sputtering
96%
Thin films
68%
Rutherford backscattering spectroscopy
67%
Ions
66%
Ion bombardment
57%
Film growth
57%
Substrates
51%
Atomic force microscopy
46%
Bias voltage
45%
Atoms
37%
X ray diffraction
35%
Fluxes
29%
Scanning electron microscopy
28%
Silicon
28%
Aluminum
27%
Temperature
14%
Physics & Astronomy
tantalum
78%
magnetron sputtering
60%
thin films
37%
ions
33%
ambient temperature
23%
bombardment
22%
backscattering
21%
radio frequencies
20%
atomic force microscopy
18%
aluminum
16%
scanning electron microscopy
15%
electric potential
13%
silicon
12%
diffraction
12%
atoms
12%
x rays
10%
energy
7%
Chemical Compounds
Magnetron Sputtering
83%
Liquid Film
35%
Ion Bombardment
31%
Rutherford Backscattering Spectroscopy
30%
Body-Centered Cubic Crystal System
29%
Ion
28%
Polycrystalline Solid
21%
Cubic Space Group
19%
Atomic Force Microscopy
19%
Voltage
17%
Scanning Electron Microscopy
14%
Purity
12%
X-Ray Diffraction
11%
Energy
11%