Temperature dependent emissivity measurements of Si, SiO2/Si, and HgCdTe

N. M. Ravindra, F. M. Tong, W. F. Kosonocky, J. R. Markham, S. Liu, K. Kinsella

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations

Abstract

The results of emissivity of (a) Si and SiO2/Si in the temperature range of 320 to 1240 K and (b). HgCdTe at temperatures of 303 and 440 K, using Fourier Transform Infrared(FTIR) spectroscopy, in the wavelength range of 1.5 to 20 μm, have been reported here. The measurements on SiO2/Si have been performed for oxide thickness ranging from 60 to 500 nm. These results coupled with calculations of emissivity from first principles lead us to model the wavelength dependence of emissivity. Emissivity estimates have been obtained for HgCdTe using its fundamental optical constants.

Original languageEnglish (US)
Pages (from-to)431-436
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume342
DOIs
StatePublished - 1994
EventProceedings of the 1994 Spring Meeting of the Materials Research Society - San Francisco, CA, USA
Duration: Apr 4 1994Apr 7 1994

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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