Abstract
Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.
Original language | English (US) |
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Pages (from-to) | 1947-1949 |
Number of pages | 3 |
Journal | Journal of Applied Physics |
Volume | 67 |
Issue number | 4 |
DOIs | |
State | Published - 1990 |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy