Based on a nonlinear coupling between the etchant species and the photo-induced carriers during photoelectrochemical etching of semiconductor surfaces, we propose that an optimum exists for the reaction rate as a function of electrolyte concentration.
|Original language||English (US)|
|Number of pages||3|
|Journal||Journal of Applied Physics|
|State||Published - 1990|
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)