The effect of vapor incidence angle upon thin-film columnar growth

A. Mazor, B. G. Bukiet, D. J. Srolovitz

Research output: Contribution to journalArticlepeer-review

24 Scopus citations


We present a generalized theory for the growth of columnar microstructure in vapor-deposited thin films under the joint influence of a constant uniform deposition flux coming down with an arbitrarily chosen incidence angle, and surface diffusion. The dependences of the zone I to zone II transition temperature, and the characteristic length scales associated with the unstable modes on the deposition angle are predicted. The surface morphology is obtained as a function of vapor incidence angle. For a specific deposition angle, there is a one-parameter family of steady-state surface profiles that corresponds to a range of possible columnar orientation angles, among which only one angle is associated with the tangent rule. These results agree with experimental observations.

Original languageEnglish (US)
Pages (from-to)1386-1391
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number3
StatePublished - May 1989
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films


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