The effect of working gas pressure and deposition power on the properties of molybdenum films deposited by DC magnetron sputtering

Hong Cao, Chuanjun Zhang, Junhao Chu

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Molybdenum films were deposited on Corning 7059 glass substrates by DC magnetron sputtering with different working gas pressures and sputtering powers. The structure and morphology, residual stress and adhesion, resistivity and optical reflectance of the as-deposited Mo films were investigated. The results show that Mo films deposited with high working gas pressure and low sputtering power have a spherical surface morphology, small grain size, residual compressive stress and a good adhesion, high resistivity and low optical reflectance. With the working gas pressure decreased and the sputtering power increased, Mo films have elongated spindle-shape or diamond flake shape surface morphology, the grain size is increased, with residual stress changed from tensile to compressive, a poor adhesion, resistivity decreased and optical reflectance increased.

Original languageEnglish (US)
Pages (from-to)947-952
Number of pages6
JournalScience China Technological Sciences
Volume57
Issue number5
DOIs
StatePublished - May 2014

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Engineering(all)

Keywords

  • back contact
  • magnetron sputtering
  • molybdenum thin films
  • solar cell

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