The effects of interfacial interactions between Fe-O and Fe-Si induced by ion-beam bombardment on the magnetic properties of Si-oxide/Fe bilayers

X. Li, K. W. Lin, H. T. Liang, H. F. Hsu, N. G. Galkin, Y. Wroczynskyj, J. Van Lierop, P. W.T. Pong

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Si/Fe and SiO2/Fe thin-film heterostructures are commonly seen in magnetic multilayer devices, whose magnetic properties are strongly influenced by intermixing at the interfaces. In this paper, Si-oxide/Fe bilayers were formed by depositing Si on Fe with in situ O2/Ar ion-beam bombardment during the Si deposition. The surface oxidation conditions were altered by applying different O2/Ar ratios (0-41%) in the ion-beam. The surface and cross-sectional morphologies, and the crystalline structures were characterized by transmission electron microscopy. The formation of Fe-O, Fe-Si and Si-O bonds at the interface of the O2/Ar ion-beam bombarded Si-oxide/Fe bilayers was evidenced by X-ray photoemission spectra. FeO, Fe3O4 and Fe2O3 at the interface resulted in a marked increase in the magnetic coercivity at low temperatures, as characterized by magnetometry.

Original languageEnglish (US)
Pages (from-to)196-201
Number of pages6
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume365
DOIs
StatePublished - Dec 15 2015
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

Keywords

  • Interface
  • Ion-beam bombardment
  • Si-oxide/Fe bilayers
  • Thin film magnetism

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