Abstract
Ion beam bombardment is a useful surface modification method in tailoring the microstructure and magnetic properties of ferromagnetic thin films. In this paper, Co thin films were bombarded by Ar+ ion beam with oxygen and then capped with Al (to prevent oxidation). The oxygen content was altered from 0 to 41% to investigate the ion-beam bombardment effect. An oxide layer containing Al2O3, Co3O4 and CoO was formed after the ion-beam bombardment with oxygen, as characterized by x-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, selected area electron diffraction, and x-ray diffraction. Enhanced coercivities (Hc's) (from 4.14 kA/m to 7.96 kA/m) and loop squareness (Mr/Ms. from 0.5 to 0.8) was induced by pure Ar+ ion-beam bombardment that resulted in domain wall pinning due to bombardment-induced defects and Co spin reordering. Hc exhibited a strong dependence on the oxygen content in the ion beam, due to the nature of the cobalt oxide formation. Field cooling to 180 K resulted in increased squareness (Mr/Ms. = 0.9) and reduced Hc. The low-field magnetization measured during zero field and field cooling to further investigate the exchange bias magnetism identified an irreversibility temperature at 320 K in a film treated by ion-beam bombardment with an O2/Ar ratio of 21%.
Original language | English (US) |
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Pages (from-to) | 41-47 |
Number of pages | 7 |
Journal | Microelectronic Engineering |
Volume | 152 |
DOIs | |
State | Published - Feb 20 2016 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
Keywords
- Cobalt
- Ion-beam bombardment
- Magnetic property