The SCALPEL proof of concept system

L. R. Harriott, S. D. Berger, C. Biddick, M. I. Blakey, S. W. Bowler, K. Brady, R. M. Camarda, W. F. Connelly, A. Crorken, J. Custy, R. DeMarco, R. C. Farrow, J. A. Felker, L. Fetter, R. Freeman, L. Hopkins, H. A. Huggins, C. S. Knurek, J. S. Kraus, J. A. LiddleM. Mkrtychan, A. E. Novembre, M. L. Peabody, R. G. Tarascon, H. H. Wade, W. K. Waskiewicz, G. P. Watson, K. S. Werder, D. Windt

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

We have designed and constructed a projection electron beam lithography system based on the SCALPEL (SCattering with Angular Limitation in Projection Electron beam Lithography) principle. The experimental tool was built to analyze the efficacy of this approach as an alternative to photolithography for future integrated circuit manufacturing. In this paper we will describe the design of the system and show preliminary results of test pattern exposures. We will show printed features down to 0.08 μm as well as lithographic properties, such as depth of focus, which has been measured at 75 μm for 0.25 μm lines and spaces.

Original languageEnglish (US)
Pages (from-to)477-480
Number of pages4
JournalMicroelectronic Engineering
Volume35
Issue number1-4
DOIs
StatePublished - Feb 1997

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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