@article{e796702078714c44b7cce7d90bd06754,
title = "The scattering with angular limitation in projection electron-beam lithography (Scalpel) system",
abstract = "A SCALPEL{\textregistered}(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.",
keywords = "Electron-beam, Lithography, Microfabrication, Projection",
author = "{Alexander Liddle}, J. and Berger, {Steven D.} and Biddick, {Chris J.} and Blakey, {Myrtle I.} and Bolan, {Keven J.} and Bowler, {Stephen W.} and Kevin Brady and Camarda, {Ron M.} and Connelly, {Wayne F.} and Andy Crorken and Joe Custy and Farrow, {Reggie C.} and Felker, {Joe A.} and Fetter, {Linus A.} and Bob Freeman and Harriott, {Lloyd R.} and Leslie Hopkins and Huggins, {Harold A.} and Knurek, {Chester S.} and Kraus, {Joe S.} and Mixon, {Dave A.} and Mkrtchyan, {Masis M.} and Novembre, {Anthony E.} and Peabody, {Milton L.} and Simpson, {Wayne M.} and Tarascon, {Regine G.} and Wade, {Harry H.} and Waskiewicz, {Warren K.} and Watson, {G. Patrick} and Williams, {Joe K.} and Windt, {David L.}",
year = "1995",
month = dec,
doi = "10.1143/JJAP.34.6663",
language = "English (US)",
volume = "34",
pages = "6663--6671",
journal = "Japanese Journal of Applied Physics",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "12",
}