The scattering with angular limitation in projection electron-beam lithography (Scalpel) system

J. Alexander Liddle, Steven D. Berger, Chris J. Biddick, Myrtle I. Blakey, Keven J. Bolan, Stephen W. Bowler, Kevin Brady, Ron M. Camarda, Wayne F. Connelly, Andy Crorken, Joe Custy, Reggie C. Farrow, Joe A. Felker, Linus A. Fetter, Bob Freeman, Lloyd R. Harriott, Leslie Hopkins, Harold A. Huggins, Chester S. Knurek, Joe S. KrausDave A. Mixon, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody, Wayne M. Simpson, Regine G. Tarascon, Harry H. Wade, Warren K. Waskiewicz, G. Patrick Watson, Joe K. Williams, David L. Windt

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

A SCALPEL®(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.

Original languageEnglish (US)
Pages (from-to)6663-6671
Number of pages9
JournalJapanese Journal of Applied Physics
Volume34
Issue number12
DOIs
StatePublished - Dec 1995

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

Keywords

  • Electron-beam
  • Lithography
  • Microfabrication
  • Projection

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