The scattering with angular limitation in projection electron-beam lithography (Scalpel) system

J. Alexander Liddle; Steven D. Berger; Chris J. Biddick; Myrtle I. Blakey; Keven J. Bolan; Stephen W. Bowler; Kevin Brady; Ron M. Camarda; Wayne F. Connelly; Andy Crorken; Joe Custy; Reggie C. Farrow; Joe A. Felker; Linus A. Fetter; Bob Freeman; Lloyd R. Harriott; Leslie Hopkins; Harold A. Huggins; Chester S. Knurek; Joe S. Kraus; Dave A. Mixon; Masis M. Mkrtchyan; Anthony E. Novembre; Milton L. Peabody; Wayne M. Simpson; Regine G. Tarascon; Harry H. Wade; Warren K. Waskiewicz; G. Patrick Watson; Joe K. Williams; David L. Windt

doi:10.1143/JJAP.34.6663

The scattering with angular limitation in projection electron-beam lithography (Scalpel) system

J. Alexander Liddle
, Steven D. Berger
, Chris J. Biddick
, Myrtle I. Blakey
, Keven J. Bolan
, Stephen W. Bowler
, Kevin Brady
, Ron M. Camarda
, Wayne F. Connelly
, Andy Crorken
, Joe Custy
, Reggie C. Farrow
, Joe A. Felker
, Linus A. Fetter
, Bob Freeman
, Lloyd R. Harriott
, Leslie Hopkins
, Harold A. Huggins
, Chester S. Knurek
, Joe S. Kraus

Dave A. Mixon, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody, Wayne M. Simpson, Regine G. Tarascon, Harry H. Wade, Warren K. Waskiewicz, G. Patrick Watson, Joe K. Williams, David L. Windt

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

A SCALPEL®(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.

Original language	English (US)
Pages (from-to)	6663-6671
Number of pages	9
Journal	Japanese Journal of Applied Physics
Volume	34
Issue number	12
DOIs	https://doi.org/10.1143/JJAP.34.6663
State	Published - Dec 1995
Externally published	Yes

All Science Journal Classification (ASJC) codes

General Engineering
General Physics and Astronomy

Keywords

Electron-beam
Lithography
Microfabrication
Projection

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10.1143/JJAP.34.6663

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Alexander Liddle, J., Berger, S. D., Biddick, C. J., Blakey, M. I., Bolan, K. J., Bowler, S. W., Brady, K., Camarda, R. M., Connelly, W. F., Crorken, A., Custy, J., Farrow, R. C., Felker, J. A., Fetter, L. A., Freeman, B., Harriott, L. R., Hopkins, L., Huggins, H. A., Knurek, C. S., ... Windt, D. L. (1995). The scattering with angular limitation in projection electron-beam lithography (Scalpel) system. Japanese Journal of Applied Physics, 34(12), 6663-6671. https://doi.org/10.1143/JJAP.34.6663

@article{e796702078714c44b7cce7d90bd06754,

title = "The scattering with angular limitation in projection electron-beam lithography (Scalpel) system",

abstract = "A SCALPEL{\textregistered}(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.",

keywords = "Electron-beam, Lithography, Microfabrication, Projection",

author = "\{Alexander Liddle\}, J. and Berger, \{Steven D.\} and Biddick, \{Chris J.\} and Blakey, \{Myrtle I.\} and Bolan, \{Keven J.\} and Bowler, \{Stephen W.\} and Kevin Brady and Camarda, \{Ron M.\} and Connelly, \{Wayne F.\} and Andy Crorken and Joe Custy and Farrow, \{Reggie C.\} and Felker, \{Joe A.\} and Fetter, \{Linus A.\} and Bob Freeman and Harriott, \{Lloyd R.\} and Leslie Hopkins and Huggins, \{Harold A.\} and Knurek, \{Chester S.\} and Kraus, \{Joe S.\} and Mixon, \{Dave A.\} and Mkrtchyan, \{Masis M.\} and Novembre, \{Anthony E.\} and Peabody, \{Milton L.\} and Simpson, \{Wayne M.\} and Tarascon, \{Regine G.\} and Wade, \{Harry H.\} and Waskiewicz, \{Warren K.\} and Watson, \{G. Patrick\} and Williams, \{Joe K.\} and Windt, \{David L.\}",

year = "1995",

month = dec,

doi = "10.1143/JJAP.34.6663",

language = "English (US)",

volume = "34",

pages = "6663--6671",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "12",

}

Alexander Liddle, J, Berger, SD, Biddick, CJ, Blakey, MI, Bolan, KJ, Bowler, SW, Brady, K, Camarda, RM, Connelly, WF, Crorken, A, Custy, J, Farrow, RC, Felker, JA, Fetter, LA, Freeman, B, Harriott, LR, Hopkins, L, Huggins, HA, Knurek, CS, Kraus, JS, Mixon, DA, Mkrtchyan, MM, Novembre, AE, Peabody, ML, Simpson, WM, Tarascon, RG, Wade, HH, Waskiewicz, WK, Watson, GP, Williams, JK & Windt, DL 1995, 'The scattering with angular limitation in projection electron-beam lithography (Scalpel) system', Japanese Journal of Applied Physics, vol. 34, no. 12, pp. 6663-6671. https://doi.org/10.1143/JJAP.34.6663

TY - JOUR

T1 - The scattering with angular limitation in projection electron-beam lithography (Scalpel) system

AU - Alexander Liddle, J.

AU - Berger, Steven D.

AU - Biddick, Chris J.

AU - Blakey, Myrtle I.

AU - Bolan, Keven J.

AU - Bowler, Stephen W.

AU - Brady, Kevin

AU - Camarda, Ron M.

AU - Connelly, Wayne F.

AU - Crorken, Andy

AU - Custy, Joe

AU - Farrow, Reggie C.

AU - Felker, Joe A.

AU - Fetter, Linus A.

AU - Freeman, Bob

AU - Harriott, Lloyd R.

AU - Hopkins, Leslie

AU - Huggins, Harold A.

AU - Knurek, Chester S.

AU - Kraus, Joe S.

AU - Mixon, Dave A.

AU - Mkrtchyan, Masis M.

AU - Novembre, Anthony E.

AU - Peabody, Milton L.

AU - Simpson, Wayne M.

AU - Tarascon, Regine G.

AU - Wade, Harry H.

AU - Waskiewicz, Warren K.

AU - Watson, G. Patrick

AU - Williams, Joe K.

AU - Windt, David L.

PY - 1995/12

Y1 - 1995/12

N2 - A SCALPEL®(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.

AB - A SCALPEL®(SCattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.

KW - Electron-beam

KW - Lithography

KW - Microfabrication

KW - Projection

UR - https://www.scopus.com/pages/publications/0029519418

UR - https://www.scopus.com/pages/publications/0029519418#tab=citedBy

U2 - 10.1143/JJAP.34.6663

DO - 10.1143/JJAP.34.6663

M3 - Article

AN - SCOPUS:0029519418

SN - 0021-4922

VL - 34

SP - 6663

EP - 6671

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 12

ER -

The scattering with angular limitation in projection electron-beam lithography (Scalpel) system

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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