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The scattering with angular limitation in projection electron-beam lithography (Scalpel) system

  • J. Alexander Liddle
  • , Steven D. Berger
  • , Chris J. Biddick
  • , Myrtle I. Blakey
  • , Keven J. Bolan
  • , Stephen W. Bowler
  • , Kevin Brady
  • , Ron M. Camarda
  • , Wayne F. Connelly
  • , Andy Crorken
  • , Joe Custy
  • , Reggie C. Farrow
  • , Joe A. Felker
  • , Linus A. Fetter
  • , Bob Freeman
  • , Lloyd R. Harriott
  • , Leslie Hopkins
  • , Harold A. Huggins
  • , Chester S. Knurek
  • , Joe S. Kraus
  • Dave A. Mixon, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody, Wayne M. Simpson, Regine G. Tarascon, Harry H. Wade, Warren K. Waskiewicz, G. Patrick Watson, Joe K. Williams, David L. Windt

Research output: Contribution to journal › Article › peer-review

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