The use of an arc plasma rotating in a magnetic field for metal coating glass suhstrates

First results are reported about deposition of metals on glass substrate using a low current are plasma source at atmospheric pressure. The are source consists of a graphite cathode rod placed on the axis of a graphite anode cylinder aligned in a magnetic field. The carrier gas is argon. The deposition material, zinc or gold, is evaporated from a reservoir in the cathode. Depositions on flat substrates positioned on the periphery of the rotating plasma within the anode tube and in ajet outside the anode have been investigated. The investigations are planned to lead towards laser fusion target pusher layer fabrication. This fabrication would be facilitated by a high pressure deposition process where target levitation is readily performed.