@inproceedings{db1af41d75e94a798e5dbd021e26a4d2,
title = "Trapping in deep defects under substrate hot electron stress in TiN/Hf-silicate based gate stacks",
author = "Chowdhury, {N. A.} and P. Srinivasan and D. Misra",
note = "Funding Information: This work was partially supported by a National Science Foundation Grant (#ECS-0140584). We thank B.H. Lee and R. Choi of SEMATECH, Austin, Texas, for the research collaboration.; 2005 International Semiconductor Device Research Symposium ; Conference date: 07-12-2005 Through 09-12-2005",
year = "2005",
language = "English (US)",
isbn = "1424400848",
series = "2005 International Semiconductor Device Research Symposium",
pages = "213--214",
booktitle = "2005 International Semiconductor Device Research Symposium",
}