Trapping in deep defects under substrate hot electron stress in TiN/Hf-silicate based gate stacks

N. A. Chowdhury, P. Srinivasan, D. Misra

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations
Original languageEnglish (US)
Title of host publication2005 International Semiconductor Device Research Symposium
Pages213-214
Number of pages2
StatePublished - 2005
Event2005 International Semiconductor Device Research Symposium - Bethesda, MD, United States
Duration: Dec 7 2005Dec 9 2005

Publication series

Name2005 International Semiconductor Device Research Symposium
Volume2005

Other

Other2005 International Semiconductor Device Research Symposium
CountryUnited States
CityBethesda, MD
Period12/7/0512/9/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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