UV inspection of EUV and SCALPEL reticles

D. W. Pettibone; N. Bareket; T. Liang; A. R. Stivers; S. D. Hector; P. J.S. Mangat; D. J. Resnick; M. Lercel; M. Lawliss; C. Magg; A. Novembre; R. Farrow

doi:10.1117/12.410699

UV inspection of EUV and SCALPEL reticles

D. W. Pettibone, N. Bareket, T. Liang, A. R. Stivers, S. D. Hector, P. J.S. Mangat, D. J. Resnick, M. Lercel, M. Lawliss, C. Magg, A. Novembre, R. Farrow

Research output: Contribution to journal › Conference article › peer-review

3 Scopus citations

Abstract

A UV inspection tool has been used to image and inspect Next Generation Lithography (NGL) reticles. Inspection images and simulations have been used to provide feedback to mask makers so that inspectability of NGL masks can be optimized. SCALPEL masks have high optical contrast and look much the same in reflection as conventional chrome on glass masks do in transmission. EPL stencil masks can be imaged well in reflection, but defects below the top surface, in the cutouts, may not be detectable optically. EUV masks that have been made to date tend to have relatively low contrast, with line edge profiles that are complex due to interference effects. Simulation results show that improved EUV inspection images can be obtained with a low reflectivity absorbing layer and proper choice of buffer layer thickness.

Original language	English (US)
Pages (from-to)	241-249
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4186
DOIs	https://doi.org/10.1117/12.410699
State	Published - 2001
Externally published	Yes
Event	20th Annual BACUS Symposium on Photomask Technology - Monterey, CL, United States Duration: Sep 13 2000 → Sep 15 2000

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

Defects
EUV
Mask inspection
NGL
Next Generation Lithography
PREVAIL
SCALPEL
Stencil mask

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10.1117/12.410699

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title = "UV inspection of EUV and SCALPEL reticles",

abstract = "A UV inspection tool has been used to image and inspect Next Generation Lithography (NGL) reticles. Inspection images and simulations have been used to provide feedback to mask makers so that inspectability of NGL masks can be optimized. SCALPEL masks have high optical contrast and look much the same in reflection as conventional chrome on glass masks do in transmission. EPL stencil masks can be imaged well in reflection, but defects below the top surface, in the cutouts, may not be detectable optically. EUV masks that have been made to date tend to have relatively low contrast, with line edge profiles that are complex due to interference effects. Simulation results show that improved EUV inspection images can be obtained with a low reflectivity absorbing layer and proper choice of buffer layer thickness.",

keywords = "Defects, EUV, Mask inspection, NGL, Next Generation Lithography, PREVAIL, SCALPEL, Stencil mask",

author = "Pettibone, {D. W.} and N. Bareket and T. Liang and Stivers, {A. R.} and Hector, {S. D.} and Mangat, {P. J.S.} and Resnick, {D. J.} and M. Lercel and M. Lawliss and C. Magg and A. Novembre and R. Farrow",

year = "2001",

doi = "10.1117/12.410699",

language = "English (US)",

volume = "4186",

pages = "241--249",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "20th Annual BACUS Symposium on Photomask Technology ; Conference date: 13-09-2000 Through 15-09-2000",

}

TY - JOUR

T1 - UV inspection of EUV and SCALPEL reticles

AU - Pettibone, D. W.

AU - Bareket, N.

AU - Liang, T.

AU - Stivers, A. R.

AU - Hector, S. D.

AU - Mangat, P. J.S.

AU - Resnick, D. J.

AU - Lercel, M.

AU - Lawliss, M.

AU - Magg, C.

AU - Novembre, A.

AU - Farrow, R.

PY - 2001

Y1 - 2001

N2 - A UV inspection tool has been used to image and inspect Next Generation Lithography (NGL) reticles. Inspection images and simulations have been used to provide feedback to mask makers so that inspectability of NGL masks can be optimized. SCALPEL masks have high optical contrast and look much the same in reflection as conventional chrome on glass masks do in transmission. EPL stencil masks can be imaged well in reflection, but defects below the top surface, in the cutouts, may not be detectable optically. EUV masks that have been made to date tend to have relatively low contrast, with line edge profiles that are complex due to interference effects. Simulation results show that improved EUV inspection images can be obtained with a low reflectivity absorbing layer and proper choice of buffer layer thickness.

AB - A UV inspection tool has been used to image and inspect Next Generation Lithography (NGL) reticles. Inspection images and simulations have been used to provide feedback to mask makers so that inspectability of NGL masks can be optimized. SCALPEL masks have high optical contrast and look much the same in reflection as conventional chrome on glass masks do in transmission. EPL stencil masks can be imaged well in reflection, but defects below the top surface, in the cutouts, may not be detectable optically. EUV masks that have been made to date tend to have relatively low contrast, with line edge profiles that are complex due to interference effects. Simulation results show that improved EUV inspection images can be obtained with a low reflectivity absorbing layer and proper choice of buffer layer thickness.

KW - Defects

KW - EUV

KW - Mask inspection

KW - NGL

KW - Next Generation Lithography

KW - PREVAIL

KW - SCALPEL

KW - Stencil mask

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U2 - 10.1117/12.410699

DO - 10.1117/12.410699

M3 - Conference article

AN - SCOPUS:17744388565

SN - 0277-786X

VL - 4186

SP - 241

EP - 249

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - 20th Annual BACUS Symposium on Photomask Technology

Y2 - 13 September 2000 through 15 September 2000

ER -

UV inspection of EUV and SCALPEL reticles

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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