VISCOUS BEHAVIOR OF PHOSPHOSILICATE AND BOROPHOSPHOSILICATE GLASSES IN VLSI PROCESSING.

R. A. Levy, K. Nassau

Research output: Contribution to specialist publicationArticle

18 Scopus citations

Abstract

The viscous behavior of phosphosilicate and borophosphosilicate glasses in VLSI processing is reviewed. Measurements of the glass transition temperature T//g, are presented for a series of glass compositions prepared by bulk fusion of a phosphosilicate matrix to which a ternary B//2O//3 component is added. From a comparison of the measured values of T//g in bulk glasses with reported values of flow temperature, T//f, for films with corresponding compositions, a correlation factor relating these two parameters is established. These results provide guidelines for optimizing stoichiometric compositions of borophosphosilicate glass systems to match thermal budget requirements. Flow and reflow profiles of films with such optimum compositions illustrate their effectiveness in achieving desirable topographies at reduced processing temperatures as well as reduced phosphorus concentrations.

Original languageEnglish (US)
Pages123-130
Number of pages8
Volume29
No10
Specialist publicationSolid State Technology
StatePublished - Oct 1 1986
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Fingerprint Dive into the research topics of 'VISCOUS BEHAVIOR OF PHOSPHOSILICATE AND BOROPHOSPHOSILICATE GLASSES IN VLSI PROCESSING.'. Together they form a unique fingerprint.

Cite this