Wafer temperature measurements and end-point detection during plasma etching by thermal imaging

Keyphrases

• Plasma Etching 100%
• Wafer Temperature 100%
• Thermal Imaging 100%
• Temperature Measurement 100%
• Endpoint Detection 100%
• Remote Sensing 33%
• In Situ Techniques 33%
• Silicon Wafer 33%
• Si Substrate 33%
• Silica 33%
• Polysilicon 33%
• Heat Transfer Coefficient 33%
• Silicon Layer 33%
• TV Camera 33%
• Etching Rate 33%
• Thermal Time Constant 33%
• Cooled Electrode 33%
• Thermal Contact 33%
• Water Cooling 33%
• Heat of Reaction 33%

Engineering

• Endpoint 100%
• Measurement Point 100%
• Silicon Wafer 50%
• Si Substrate 50%
• Constant Time 50%
• Polysilicon 50%
• Heat Transfer Coefficient 50%
• Silicon Layer 50%
• Etch Rate 50%

Material Science

• Plasma Etching 100%
• Silicon 33%
• Silicon Wafer 33%
• Heat of Reaction 33%